ALD & PECVD Combination Tube Furnace System - OTF-1200X-ALD
ALD & PECVD Combination Tube Furnace System - OTF-1200X-ALD
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OTF-1200X-ALD is a dual zone tube furnace combining ALD ( Atomic Layer Deposition ) and PECVD ( plasma enhanced chemical vapor deposition )
for preparing new generation thin film
for preparing new generation thin film
- Two 10 ms ALD valves for ultra-thin film deposition
- Lower temperature processing is required compared to the conventional CVD
- High heating & cooling rate using sliding furnace
- Dual heating zone to create thermal gradient up to 500ºC
- 1100ºC Max. working temperature in the tube furnace
- 1100ºC Max. working temperature in pre-heater for heating vapor phase or evaporating solid materials
- Rapid cooling & Heating for growing 2D materials
Control Pannel
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Plasma RF Power Supply |
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Oil-less Vacuum Pump Station and Valves
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Sliding mechanism |
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Optional |
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Overall Dimensions |
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Laptop, software & WiFi Control (Optional)
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Compliance
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