1200°C MIST CVD Furnace for Crystal Growth- OTF-1200X-Mist
1200°C MIST CVD Furnace for Crystal Growth- OTF-1200X-Mist
Minimum Order: $20 (equipment), $100 (crystals)
Price: RFQ
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SPECIFICATIONS:
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Features |
OTF-1200X-Mist is a 1200ºC tube furnace integrated with an ultrasonic mist system for epitaxial thin film or single crystal growth via the mist CVD method, also called Aerosol-assisted chemical vapor deposition (AACVD) |
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Control Panel |
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| Dimensions | TBD |
| Net Weight | TBD |
| Warranty |
One-year limited warranty with lifetime support (Consumable parts such as processing tubes and o-rings are not covered by the warranty, please order the replacement at related products below.)
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| Application |
This kind of MIST CVD can be used to grow Ga2O3 crystal with high quality
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