OTF-1200X-S-Mist is a compact, economical mist chemical vapor deposition (Mist CVD) system, also known as aerosol-assisted chemical vapor deposition (AACVD), designed for epitaxial thin-film deposition and crystal growth at temperatures up to 1200°C. The system integrates a split tube furnace, a 1.7 MHz ultrasonic mist generator, a precision liquid syringe pump, and a two-channel gas delivery system.
The ultrasonic generator converts liquid precursors into a fine aerosol, which is transported into the heated quartz processing tube by carrier gas. The system includes a quartz sample holder capable of accommodating four substrates and is suitable for research applications involving gallium oxide (Ga2O3) thin films and crystal growth.
SPECIFICATIONS
| Features & Applications |
- Compact, economical Mist CVD / aerosol-assisted chemical vapor deposition (AACVD) system
- Designed for epitaxial thin-film deposition and crystal growth
- Maximum furnace working temperature: 1200°C
- Integrated split tube furnace
- Integrated 1.7 MHz ultrasonic mist generator
- Automatic liquid precursor delivery using a syringe pump
- Two-channel gas delivery system with gas mixing tank
- High-purity quartz processing tube with vacuum flanges
- Quartz sample holder for four substrates
- Suitable for Ga2O3 thin-film and crystal growth research
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| Split Tube Furnace |
- Furnace model: OTF-1200X-S
- Split-type tube furnace design
- Maximum working temperature: 1200°C
- Total heating zone length: 200 mm
- Constant-temperature zone length: 60 mm
- Programmable temperature controller with 30 segments
- Specified temperature control accuracy: ±1°C
- Rated furnace power: 1.2 kW
- Input voltage: 120V AC ±10%
- Phase: Single phase
- Frequency: 50/60 Hz
View OTF-1200X-S furnace specifications.
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| Quartz Processing Tube & Flanges |
- Processing tube material: Quartz
- Outer diameter: 60 mm
- Inner diameter: 55 mm
- Tube length: 600 mm
- Quartz processing tube included
- Vacuum sealing flanges included
- KF25 vacuum connection with valve installed on the processing tube flange
- Replacement quartz tubes available separately
View replacement quartz tube options.
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| Quartz Sample Holder |
- One quartz sample holder included
- Substrate capacity: Four pieces
- Supported substrate dimensions: 10 × 10 × 0.5 mm each
- Substrate holding angle: 45°
- Designed for positioning substrates inside the quartz processing tube during deposition
- Replacement sample holders available separately
View quartz sample holder.
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| Ultrasonic Mist Generator |
- Ultrasonic generator frequency: 1.7 MHz
- Ultrasonic generator housed inside an airtight SS316 stainless steel tank
- Three adjustable ultrasonic power output levels
- Seven timer settings
- Automatic liquid precursor injection using an integrated syringe pump
- Connected to the tube furnace using 1/4" stainless steel tubing
- Optional mist generator heating function available upon request
- Maximum optional heating temperature: 250°C
View ultrasonic mist generator specifications.
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| Ultrasonic Power & Liquid Injection Settings |
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Level 1 – Low: Recommended liquid injection rate of 0.2 mL/min
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Level 2 – Medium: Recommended liquid injection rate of 0.4 mL/min
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Level 3 – High: Recommended liquid injection rate of 0.6 mL/min
- The syringe pump injection rate should be matched to the ultrasonic power output level to maintain effective atomization.
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| Ultrasonic Generator Timer Settings |
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Setting 1: Continuous operation without a preset time limit
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Setting 2: 30 minutes
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Setting 3: 60 minutes
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Setting 4: 90 minutes
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Setting 5: 120 minutes
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Setting 6: 150 minutes
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Setting 7: 180 minutes
- Timer settings are selected using the generator's "Out" indicator/control.
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| Automatic Liquid Syringe Pump |
- Automatic liquid precursor injection system included
- One 20 mL plastic syringe included
- Adjustable liquid injection rate: 0.004–70 mL/min
- Recommended injection rate depends on the ultrasonic generator power setting.
- Designed to deliver liquid precursor to the ultrasonic atomization chamber
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| Two-Channel Gas Delivery System |
- Gas delivery system model: CGM-2F
- Two floating-type gas flowmeters
- Flowmeter range: 16–160 mL/min
- One integrated stainless steel gas mixing tank
- Three pipe fittings for 1/4" tubing
- Compatible tubing materials: Nylon or stainless steel
- Three SS304 stainless steel vacuum needle valves
- Designed for controlled gas delivery and mixing during Mist CVD processing
View two-channel gas delivery system.
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| Optional Vacuum Pump |
- Vacuum pump is optional and not included.
- KF25 vacuum port installed on the processing tube flange
- Vacuum connection includes a valve.
- Dry vacuum pump strongly recommended for longer service life in Mist CVD applications
- Optional oil-free vacuum pump available separately
View optional dry vacuum pump.
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| Application: Gallium Oxide Growth |
- Suitable for research involving gallium oxide (Ga2O3) crystal growth
- Supports aerosol-assisted deposition of gallium oxide thin films
- Applicable to epitaxial growth research using suitable precursor solutions and substrates
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| Research Reference |
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| Related Precursor: Gallium(III) Acetylacetonate |
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| Related Substrate Materials |
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| Compliance |
- CE certified
- NRTL or CSA certification available at additional cost
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