YAlO3 is excellent substrate for HTS film and II-V nitride, as well as many oxide films due to its chemical stability and lattice matching.
Structure |
Lattice (A) |
Melting Point |
Density g/cc |
Dielectric Constant |
Thermo-Expans x10-6/K |
Max. Xtl Size |
Orthor. |
a=5.3286(4) b=7.3706(5) c=5.1796(3) |
1870 0C |
4.88 |
16-20 |
2-10 |
30d x 50mm |
XRD diffraction angle: 20°54' <110> and (41°44') <220>
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