1100C PE-HPCVD Rotary Furnace with In-situ Evaporator, 4 Channel MFC & Vacuum Pump - OTF-1200X-S-II-PEC4
1100C PE-HPCVD Rotary Furnace with In-situ Evaporator, 4 Channel MFC & Vacuum Pump - OTF-1200X-S-II-PEC4
Out of stock
Price: RFQ
SKU: : \OTF-1200X-S-II-PEC4
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OTF-1200X-S-II-PEC4 is a 1200ºC Rotatable Two-Zone Plasma-Enhanced Hybrid-Physical-Chemical Vapor Deposition (PE-HPCVD) system. It consists a 300W RF (Ratio Frequency) Plasma Generator & Matching Network, Up-Stream Source Evaporation Boat with Power Supply, Four-Channel MFC Gas Delivery, and High-Performance Vacuum Pump. Such a complete system is an excellent tool for heat-treating inorganic compound powders with superior temperature and surface coating uniformity (e.g. prepare Li-Ion battery cathode powders with conductive coatings on sample surface).
(Item number has been updated from OTF-1200X-S-II-4CV-PE since March 2019)
SPECIFICATIONS:
(Item number has been updated from OTF-1200X-S-II-4CV-PE since March 2019)
SPECIFICATIONS:
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Two-Zone Rotary Furnace |
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Plasma RF Power Supply
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Tube Rotation Speed
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Vacuum Pump & Gauge
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MFC Gas Mixing Station |
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Warranty
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One year limited warranty with lifetime support (Consumable parts such as processing tubes, O-rings, and heating elements are not covered by the warranty, please order replacements at related products below).
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