VTC-16-3HD-LD is a compact three rotary target plasma sputtering coater with a touch screen digital controller, and a substrate heater capable of heating up to 500 °C. It can coat 1- 3 types of metallic materials to sample with a diameter up to 50 mm. Three sputtering targets: gold, silver, and copper are included for immediate use.

SPECIFICATIONS:

Input Power	Single-phase 220 VAC, 50 / 60Hz 700 W (not including vacuum pump) For using under 110 VAC, a 1500W transformer will be needed.
Output Power	1600 VDC 40 mA max
Vacuum Chamber	Vacuum chamber: 150 mm ID x 165mm OD x 150 mm H, made of high-purity quartz Sealing flange made of stainless steel with flat O-ring Please click here to order the Quartz Chamber replacement.
Sample Stage	Stage size: 50 mm Dia. Sputtering distance range: 25 – 40 mm adjustable Rotatable stage with three sputtering positions (controlled by the touch screen)
Optional Heater for Sample Stage	The Substrate Heater has a maximum heating temperature of 500°C. PID temperature controller with +/- 1°C accuracy is integrated into the touchscreen. Please select from the options bar.
Control Panel	6” color touch screen with PLC integration for easy operation The vacuum gauge, sputtering current meter, and substrate temperature control are integrated into the touchscreen panel Adjustment knobs on the front panel for gas intake and sputtering current control Sputtering position, sputtering timer, and process logging are accessible from the touchscreen
Shield	Stainless steel shield cage is included for extra protection
Sputtering Targets	Target size requirements: 47 mm Dia. x 2.5 mm max Three targets are included in the standard package for immediate use: Au target, 47 mm Dia. x 0.12 mm Ag target, 47 mm Dia. x 0.5 mm Cu target, 47 mm Dia. x 2.5 mm Please click here to see recommended coating parameters for Au & Cu Target Various targets are available to order at MTI
Vacuum Pump (Optional)	Built-in KF25 vacuum port for connecting to a vacuum pump (Pic #1) A vacuum pump with a KF25 connector is required, but not included. User may choose A double-stage vacuum pump for vacuum up to 1.0E-2 Torr (Click Pic #2 to order) Or a turbopump for vacuum up to 1.0E-5 Torr  (Click Pic #3 to order) The vacuum pump can be plugged into the power outlet on the left of the coater for automatic control
Dimensions
Net Weight	50 kg
Operation Instructions
Compliance	CE approval NRTL certification is NOT available temporarily.
Warranty	One year limited with lifetime support
Application Notes	For the best film-substrate adhesion strength, please clean the substrate surface before coating: Ultrasonic cleaning (Click the picture below to order) with the following sequential baths - (1) acetone, (2) isopropyl alcohol - to remove oil and grease. Blow dry the substrate with N2, then hot bake in a vacuum to remove absorbed moisture Plasma cleaning (Click the picture below to order) may be needed for surface roughening, surface chemical bonds activation, or additional contamination removal A thin buffer layer (~5 nm), such as Cr, Ti, Mo, Ta, could be applied to improve the adhesion of metals and alloys A two-stage pressure regulator (not included) should be installed on the gas cylinder to limit the output pressure of the gas to below 0.02 MPa for safe usage. Please use > 5N purity Ar gas for plasma sputtering HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the equipment before sample loading and target changing operations This model is not suitable for coating light metallic materials such as Al, Mg, Zn, Ni, etc. due to its low energy. Please consider our magnetron sputtering coater or thermal evaporation coater. Click the pictures below for detail                                                                                           Ultrasonic Cleaner                Plasma Cleaner                  Magnetron Sputtering             Thermal  Evaporation