• 950°C Max CSS and RTP Furnace With Rotating Holder for 12" Wafer - OTF-1200X-RTP-II-CSS-300
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950°C Max CSS and RTP Furnace With Rotating Holder for 12" Wafer - OTF-1200X-RTP-II-CSS-300

950°C Max CSS and RTP Furnace With Rotating Holder for 12" Wafer - OTF-1200X-RTP-II-CSS-300

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SKU: OTF-1200X-RTP-II-CSS-300

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OTF-1200X-RTP-II-5-R is an advanced rapid thermal processing (RTP) furnace,  which is designed for CSS (Close Spaced Sublimation) film coating up to 12" wafer at the working temperature of 950°C Max. The furnace is heated by two groups of halogen heaters (Top and Bottom) separately with max. 20ºC/s heating rate. The top sample holder is rotatable to achieve a uniform coating. It is an excellent tool to research new generation thin films for solar cells, such as CdTe, Sulfide, and Perovskite solar cells, and also can be used for annealing 12" semiconductor wafers.

SPECIFICATIONS:
Furnace structure 
  • The Vacuum chamber ( 20" ID) is made of  Stainless steel to reach 10-5 torr via turbopump
  • Two 12"  IR heating plates are located on the top of the bottom inside the chamber
  • The top sample holder is rotatable at a speed of 1 - 10 RPM for uniform film deposition
  • Max. working temperature is 950ºC and  The heating rate can reach 1200oC/minute max.
  • Eurotherm precision temperature controller with +/- 0.1oC accuracy
  • Touch Screen Computer control for all processing parameters
Power
  • 208 - 240VAC, three phases, 50/60 Hz  ( 380V AC 3 phase is available )
  • 60 KW max.  ( 200A breaker needed )
  • A power cable is included, but no plug
Vacuum Chamber
 
  • Chamber dimension: ID 500mm x H 460mm
  • Two 60mm dia quartz windows are built for easy observation.
  •  One air-tight sliding baffle is built-in for blocking the evaporation source under high vacuum/
  • A precision anti-corrosion digital vacuum gauge is in the standard package (Pic. 1)
  • Vacuum level: 10-5 torr by turbopump ( Pic. 2) or 10-2 torr by a mechanical pump (pic. 3) Please click Pic.2 2 or 3 to choose the vacuum pump at extra cost
  • Pic.1         Pic. 2   Pic. 3
Heater and Sample Holder
  • Two IR heaters are located on top and bottom of the chamber with adjustable gaps from 2 - 25 mm. (Pic. 1
  • Heaters are made of stainless steel with a water cold jacket to keep heat insulation.
  • 12 " Dia. the circular wafer holder is built into the top heater for holding the substrate.
  • The graphite plates are placed on the top of the IR heater to make heating more uniform (Pic. 2)
  • The top sample holder is rotatable at an adjustable speed from 1 - 10 RPM
  • A 58L/min circulating water chiller is included for cooling heaters (Pic.3)
  •   Pic. 1    Pic. 2Pic. 3
Control System
  • Two Eurotherm 3000 digital temperature controllers with 24 segments programmable offer independent controlling of top and bottom heaters with +/- 0.1ºC accuracy
  • All operations, such as temperature profiles, vacuum pressure, rotation speed,  rotation speed and lifting of the flange are controlled by a touch screen computer via a PLC.
  • The computer can show the temperature and vacuum profiles and star 10 pre-set programs of processing


Working Temperature
  • Max. temperature for each heater: ≤ 950ºC.
  • Max. the temperature difference between the two heaters: ≤ 300ºC 
  • Max. Heating: < 8ºC/s ( heating single heater only )
  • Max. Cooling: < 20 ºC/s (600 - 100ºC) Max.
Heating & Cooling Rate
  • Heating: < 8ºC/s ( heating single heater only )
  • Cooling: < 10ºC/s (600 - 100ºC) Max.
Dimensions

( click pic to see dimension )  		 L 1450 X W 1250 X H2100 mm     Weight: ~500 Kg




Optional
  • If using corrosive gas, please use a cold trap or anti-corrosive dry pump as in pictures 1-2 at extra cost.
  • You may choose a digital MFC gas delivery system by clicking Pic. 3 below.
             Pic. 1    Pic. 2     Pic.3
Warranty One year limited with lifetime support ( Consumable parts such as quartz tubes and heating lamps are not covered by the warranty).
Compliance
  • CE Certified
  • UL / MET / CSA Certification is available upon request, additional charges will apply.
Operation Instructions      
References
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