• Atmospheric Plasma Beam with Automatic Scanning System and Heating Plate for Surface Treatment- GSL1100X-PJF-H
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Atmospheric Plasma Beam with Automatic Scanning System and Heating Plate for Surface Treatment- GSL1100X-PJF-H

Atmospheric Plasma Beam with Automatic Scanning System and Heating Plate for Surface Treatment- GSL1100X-PJF-H

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SKU: GSL1100XPJF-H

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GSL1100X-PJF-H combines an atmospheric plasma beam, a two dimensions automatic working stage, and a heating plate together, which allows the plasma beam to scan the sample surface according to the program setting and surface coating or treatment consistency and uniformity. The system consists of an RF generator, flexible gas delivery pipe, plasma beam head, the X-Y working stage, vacuum chuck sample holder, a programmable control box, heat plates, and a temperature control box. The plasma beam can activate and clean material surface rapidly at low temperature without vacuum, such as single crystal wafer, optical component, plastics, etc, It also makes plasma-enhanced CVD film on the substrate via a mixture of chemical gas under atmospheric pressure.


SPECIFICATIONS

Input Power for Plasma 208 V - 240VAC, 50/60 Hz, < 1000W
RF Generator 
 Output Frequency: 20-23 kHz, 25KV  (click picture below - left to see detailed specs)
Plasma Beam Head: Round head: 10-12mm
        
Input Gas Pressure and Working Gases
  • 40 PSI min. (0.055 Mpa)
  • Air, N2, Ar, He, or any mixed gases (no flammable and explosive gases)
Plasma Working Pressure 7- 10 PSI

Working Environment
  • Temperature: < 42°C
  •  Humidity: ≤ 40%RH
  •  No flammable gas

Sample Stage & Controller
  • X-Y two dimensions are driven by step motors and controlled by the CNC control box.
  • Z-axis is adjustable manually
  • The control box has an LCD display and the scanning program can be set by the function key
  • Max. scanning area: 200 (X direction) x 100 (Y direction) mm
  • One 500°C Max heating plate is installed on the CNC for sample heating.
  • One 4" diameter vacuum chunk can be replaced with the heating plate, which can hold thin wafers up to 6" diameter on the sample holder firmly
  • One vacuum pump is included to connect to the vacuum chuck
  • The whole system is placed on a heavy-duty mobile cart  (600 x 600 x 900L mm)
                   
Heating Plate
  • Max Temperature: 500°C
  • Voltage: AC 220V, 50 - 60 Hz (Can be used under 110V with a transformer)
  • Power: 1500W
  • Heating Area: 180 x 180mm 

Dimensions & Net Weight
  • Coating Stage with Frame: 630 x 500 x 700 mm (W x D x H)
  • Plasma Generator: 390 x 500 x 220 mm (W x D x H)
  • CNC Controller: 390 x 400 x 180 (W x D x H)
  • Net weight: 55 kg

Warranty & Certificate
  • One-year limited warranty with lifetime support
  • CE certified




Operation Instructions
    
Application Notes

Please click the link to learn more about the AP-PECVD application: Atmospheric-Pressure Plasma-Enhanced Chemical Vapour Deposition (AP-PE-CVD) For Growth Of Thin Films At Low Temperature.
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