AlN  Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method.  AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

• Sizes                                                             10mmx10mm
•  Substrate Sapphire Orientation:              c axis (0001) +/- 1.0 deg.
• Type and Doping for the AlN film:               Undoped, Semi-insulating
• Macro Defect Density:                                  <5 cm^-2
• Front Surface Finish (Al Face):                   As-grown
  
• Back Surface Finish Sapphire                    as-received finish
•  Useable Surface Area                                >90% 
•  Edge Exclusion Area                                   1mm
•   Package                                                        Single Wafer Container
• AlN layer thickness                                       1000 nm +/- 5%

• AlN MSDS
  

Related Products

Thin Films  A-Z	Crystal wafer A-Z	Plasma Cleaner	Wafer Containers	Dicing saw	Film Coater