AllN Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method. AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

• Sizes                                                        4” Round 
•  Dimensions:                                              100 mm +/- 2mm
•  Substrate Sapphire Orientation:                   c-axis (00.1) +/- 0.3deg.
• Type and Doping:                                       Undoped, Semi-insulating
• Macro Defect Density:                                  <=5 cm^-2
• Front Surface Finish (Al Face):                                  As-grown
• Back Surface Finish Sapphire                      as-received finish
•  Useable Surface Area                                 >90% 
•  Edge Exclusion Area                                    1mm
•   Package                                                    Single Wafer Container
• AlN layer thickness                                     1000 nm , (¡À 10%)

•   AlN MSDS

Related Products

Thin Films  A-Z	Crystal wafer A-Z	Plasma Cleaner	Wafer Containers	Dicing saw	Film Coater