AlN  Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method.  AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

• Sizes                                                      2" round
• AlN thin film orientation:                           (0001)
• Substrate Sapphire Orientation:                 c axis (0001) +/- 1.0 deg.
  Type and Doping  for the AlN film                  Undoped, Semi-insulating
• Macro Defect Density:                              <=5 cm^-2
• Front Surface Finish (Al Face):                    As-grown
  
• Back Surface Finish Sapphire                      as-received finish
•  Useable Surface Area                               >90% 
•  Edge Exclusion Area                                 1mm
•   Package                                                Single Wafer Container
• AlN layer thickness                                    1000 nm +/- 5%
• Polish:                                                     One side polished
  

•   AlN MSDS 

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