Thermal Evaporation System for 2" Wafer w/ 4 Sources & One Temperature Controller - GSL-1700X-EV4
Thermal Evaporation System for 2" Wafer w/ 4 Sources & One Temperature Controller - GSL-1700X-EV4
Out of stock
Price: RFQ
SKU: : \GSL-1700X-EV4
Choose your Variant:
GSL-1700X-EV4 is a thermal evaporating system with a total of 4 evaporating sources and precision and programmable temperature control. Four evaporating crucibles could be used to deposit multiple different materials to grow multilayer films one by one in the same chamber atmosphere. The system is suitable for coating most of the film of the metallic and organic material up to 2" in size from 200 ºC to 1500 ºC (or 200 ºC - 1700 ºC with an optional B-type thermocouple).
Also, this device can be modified to coat 4" dia. wafer via a single crucible evaporating.
SPECIFICATIONS:
Structure & Features |
|
Input Power |
|
Temperature Control & Heaters |
|
Rotatable Sample Holder |
|
Film Thickness Analysis System |
|
Vacuum |
|
Gas Inlet |
|
Optional |
|
Quartz Chamber Dimension |
O.D.:280mm ( 11") I.D.: 260mm ( 10.2") Length: 310mm ( 12.2") Please click here to order the Quartz Chamber replacement. |
Compliance |
|
Application Notes |
|
Standard Package
Item No.
|
Description
|
Pic | Quantity |
|
Quartz chamber 280 mm OD (ID = 260 mm, L = 310 mm) |
|
1
|
Alumina outer crucible set (lid, thermal block, bottom crucible) |
1
|
||
SPC2-AC |
Alumina cone-shaped crucible (OD = 19.6 mm, L = 24.0 mm)
|
4
|
|
PGC-554-LD |
Anti-corrosive capacitance diaphragm gauge & controller with power supply, up to 3.8E-5 Torr
|
Optional
|
|
SPC2-TB |
Tungsten coil heater, 1 mm wire diameter
|
2
|
|
SPC2-Thermocouple-S |
1
|
||
B type thermocouple (at extra cost) - heating from 200 ºC - 1700 ºC
|
Optional
|
||
Tee flange for secure vacuum connection
|
1
|