Nickel <111> Film (100nm) + 300 nm SiO2 coated Silicon Wafer -4" dia .(100) P/Boron ,SSP, R:1-20 ohm.cm
Nickel <111> Film (100nm) + 300 nm SiO2 coated Silicon Wafer -4" dia .(100) P/Boron ,SSP, R:1-20 ohm.cm
Low stock: 6 left
Regular price
$498.00 USD
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$498.00 USD
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per
SKU: : \FmNi100SO300onSiBa100D0525C1
Nickel Metallic Film
- Nickel Thickness: 100nm
- Film Crystallinity: (111) - oriented polycrystals
- Roughness, RMS: N/A
Silicon Wafer Specifications:
- Conductive type: Si P- type, B-doped
- Resistivity: 1-20 ohm-cm
- Size: 4" diameter +/- 0.5 mm x 0.525 +/- 0.025 mm th
- Orientation: (100) +/- 0.5o
- Polish: One sides polished
- Surface roughness: Prime
- Packing: Vacuum packed on a 4" single wafer carrier
- Optional: you may need tool below to handle the wafer ( click picture to order )
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