Economic MIST CVD Furnace (1200°C Max. ) for Crystal Growth- OTF-1200X-S-Mist
Economic MIST CVD Furnace (1200°C Max. ) for Crystal Growth- OTF-1200X-S-Mist
Minimum Order: $20 (equipment), $100 (crystals)
Price: RFQ
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SPECIFICATIONS:
Features |
OTF-1200X-S-Mist is a compact and economic MIST CVD system for epitaxial thin film or single crystal growth up to1200ºC. The furnace is integrated with a 1.7MHz ultrasonic mist generator and 2 channel gas delivery system |
Furnace |
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Quartz Tube & Sample Holder |
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Ultrasonic Mist Generator |
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Vacuum Pump ( optional ) ![]() |
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Application |
This kind of mist CVD can be used to grow Ga2O3 crystal with high quality
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Compliance |
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Reference article |
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