CVD
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Horizontal Directed Crystallization (HDC) Tube Furnace, 1100C Max. - OTF-1200X-50-DSL
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Furnace w/ 1.7MHz Ultrasonic Spraying up to 1800C for Special-Particle Formation - GSL-1800X-PGEP
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1200C Three Zone HPCVD 5"D Tube Furnace with Sequential & Co-Deposition Source Feeding System up to 3 Crucibles - OTF-1200X-III-HPCVD-S3
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1200C PE-HPCVD Rotary Furnace with In-situ Evaporator, 4 Channel MFC and Vacuum Pump - OTF-1200X-II-PEC4
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1200C Dual Zone Split Tube Furnace w/ Sample Feeding System upto 4 Crucibles For HPCVD - OTF-1200X-II-ZL
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Email for Lead Time1200C Tube Furnace with Internal Travel Mechanism For HPCVD - OTF-1200X-S-HPCVD
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1200C Max Dual Sliding Tube Furnace with 50 mm Tube Flanges for TCVD - OTF-1200X-S-50-DFSL
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1200C Max. Ultrasonic Spray Pyrolysis 3-Zone Furnace for Nano Particles Synthesis - OTF-1200X-III-PGEP
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Email for Lead Time1600°C Max. MIST/LPCVD System up to 6" Wafer - MIST-1600-6
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Email for Lead Time1200°C Microwave Plasma Assisted CVD Rotary Furnace w/ 2" Tube - GSL-1200R-MWPE
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Email for Lead TimeEconomic MIST CVD Furnace (1200°C Max. ) for Crystal Growth- OTF-1200X-S-Mist
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Micro-CVD/PVD Furnace for in-Situ Analysis w. 2 Heating Zones, 1100°C Max. - GSL-1100-Micro
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Email for Lead Time1650 Steam Oxidation-Corrosion Furnace GSL-1700X-80CVD
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1200°C Max Microwave Plasma Assisted CVD (MPCVD) 2" Tube Furnace - GSL-1200X-50-MWPE
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Email for Lead Time1200°C MIST CVD Furnace for Crystal Growth- OTF-1200X-Mist
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1600°C Max. MIST CVD Furnace for Continuous Growth of Carbon Nanotube - GSL-1600X-CFM
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