CVD Furnace
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Single Zone Tube Furnace (80 mm Dia, 1200C Max) with 3 Channel Gas Mixer, Vacuum Pump, and Anti-Corrosive Vacuum Gauge - OTF-1200X-80-F3LV
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1700C Three Zone 60mm Alumina Tube Furnace with Gas Mixer & Vacuum* System - GSL-1700X-60-III-F3LV
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1700C Single Zone Alumina Tube Furnace with 3 Channel Gas Mixer, Vacuum Station, and Anti-Corrosive Vacuum Gauge - GSL-1700X-F3LV
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3 Zone Furnace (5" Dia, 1200C Max) w/ Sliding Flange, Gas Mixer & Vacuum Pump -OTF-1200X-III-5-C3LVSF
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Two Zone 1200°C Max. 80 mm OD Tube Furnace with Liquid Evaporator, Humidity & H2 Detectors and Shutoff Valve - OTF-1200X-II-80HG-UL
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1200C Tube Furnace w/ Anti-Corrosive Set: PTFE Flanges and Gas Mixer - OTF-1200X-80-F3LV-PTFE
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1.7MHz Ultrasonic Spray Pyrolysis Furnace 1200C Max. for Synthesis Nanoparticles - OTF-1200X-PGEP
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Horizontal Directed Crystallization (HDC) Tube Furnace, 1100C Max. - OTF-1200X-50-DSL
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Furnace w/ 1.7MHz Ultrasonic Spraying up to 1800C for Special-Particle Formation - GSL-1800X-PGEP
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1200C Three Zone HPCVD 5"D Tube Furnace with Sequential & Co-Deposition Source Feeding System up to 3 Crucibles - OTF-1200X-III-HPCVD-S3
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1200C PE-HPCVD Rotary Furnace with In-situ Evaporator, 4 Channel MFC and Vacuum Pump - OTF-1200X-II-PEC4
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1200C Dual Zone Split Tube Furnace w/ Sample Feeding System upto 4 Crucibles For HPCVD - OTF-1200X-II-ZL
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1200C Tube Furnace with Internal Travel Mechanism For HPCVD - OTF-1200X-S-HPCVD
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1200C Max Dual Sliding Tube Furnace with 50 mm Tube Flanges for TCVD - OTF-1200X-S-50-DFSL
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1200C Max. Ultrasonic Spray Pyrolysis 3-Zone Furnace for Nano Particles Synthesis - OTF-1200X-III-PGEP
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1600°C Max. MIST/LPCVD System up to 6" Wafer - MIST-1600-6
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