1200°C MIST CVD Furnace for Crystal Growth- OTF-1200X-Mist
1200°C MIST CVD Furnace for Crystal Growth- OTF-1200X-Mist
Out of stock
Price: RFQ
SKU: : \OTF-1200X-Mist
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SPECIFICATIONS:
Features |
OTF-1200X-Mist is a 1200ºC tube furnace integrated with an ultrasonic mist system for epitaxial thin film or single crystal growth via the mist CVD method. |
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Control Panel |
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Dimensions | TBD |
Net Weight | TBD |
Warranty |
One-year limited warranty with lifetime support (Consumable parts such as processing tubes and o-rings are not covered by the warranty, please order the replacement at related products below.)
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Application |
This kind of mist CVD can be used to grow Ga2O3 crystal with high quality
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Compliance |
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Reference article | |
Operation Video |
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