- ALD/CVD/PVD
- CVD Furnace
- Graphene and 2D Materials Research
- High-Throughput & Automation Heat Treatment
- PVD Furnace
1200C Dual Zone Split Tube Furnace w/ Sample Feeding System upto 4 Crucibles For HPCVD - OTF-1200X-II-ZL
1200C Dual Zone Split Tube Furnace w/ Sample Feeding System upto 4 Crucibles For HPCVD - OTF-1200X-II-ZL
Minimum Order: $20 (equipment), $100 (crystals)
Price: RFQ
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OTF-1200X-II-ZL is a hybrid PVD and CVD ( HPCVD) deposition system with four evaporation sources for preparing multilayer 2D materials up to 1200oC. The system is consists of a dual-zone split tube furnace with the revolving sample feeding system that can drive the crucible into a processing tube at the desired temperature in the different position of the heating zone. The revolving feed system can push and draw a crucible with evaporation material through the atmosphere controlled tube furnace and sequentially evaporate the material one by one upto four crucibles as the program. Its built-in PLC touchscreen allows users to manage the feeding method and monitor the temperature of each sample. Two 30-segment programmable PID temperature controllers provide excellent control without temperature overshooting.
SPECIFICATIONS:
SPECIFICATIONS:
Furnace Structure![]() ![]() |
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| Power Requirement |
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| Heating Zone Length |
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Constant Temp. Zone![]() |
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| Temperature Range | 100~1100°C (Continuous); 1200°C (<1 hour) |
| Max. Heating Rate | ≤ 20°C /min |
| Revolving Feeding Stock System |
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| Crucible Movement Control |
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Temperature Controllers![]() |
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| Tube Accessories |
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| Digital Vacuum Gauge |
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| Vacuum Pump |
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| Gas Flow Control System |
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| Water Chiller |
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| Laptop, software & WiFi Control (Optional) |
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| Application Notes Click here to learn the installation of a gas regulator. |
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