1200C PE-HPCVD Rotary Furnace with In-situ Evaporator, 4 Channel MFC and Vacuum Pump - OTF-1200X-II-PEC4
1200C PE-HPCVD Rotary Furnace with In-situ Evaporator, 4 Channel MFC and Vacuum Pump - OTF-1200X-II-PEC4
Out of stock
Price: RFQ
SKU: : \OTF1200XIIPEC4
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OTF-1200X-II-PEC4 is a 1200ºC Rotatable Two-Zone Plasma-Enhanced Hybrid-Physical-Chemical Vapor Deposition (PE-HPCVD) system. It consists of a Tiltable Frame, 300W RF Plasma Generator & Matching Network, Up-Stream Source Evaporation Boat with Power Supply, Four-Channel MFC Gas Delivery, and High-Performance Vacuum Pump. Such a complete system is an excellent tool for heat-treating inorganic compound powders with superior temperature and surface coating uniformity (e.g. prepare Li-Ion battery cathode powders with conductive coatings on the surface).
SPECIFICATIONS:
SPECIFICATIONS:
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Two-Zone Rotary Furnace |
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Tube Rotation Speed
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Furnace Tilt Angle
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Vacuum Pump & Gauge
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MFC Gas Mixing Station
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Volumetric Feeder and Collector Tank (Optional)
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